CAS NO.15112-89-7 Tris(dimethylamino)silane

CAS NO.15112-89-7 Tris(dimethylamino)silane  

Atomic layer deposition (ALD) is a chemically self-limiting deposition technique that is based on the sequential use of a gaseous chemical process. A thin film (as fine as -0.1 Å per cycle) results from repeating the deposition sequence as many times as needed to reach a certain thickness. The major characteristic of the films is the resulting conformality and the controlled deposition manner.

Daken Chemical Limited  is a hi-tech company specialized in the area of R&D, production and sale of high end organosilicone productions. We have a group of scientific researchers with rich experience in this area. Daken concentrates on the exploit and manufacturing of kinds of new organosilicone monomers and intermediates. Our products cover organohalosilanes, organic amino silanes, organic hydrogen silanes, organoalkoxysilanes, chain-alkyl silanes, alkynylsilanes and fluoroalkyl silane, ect.

Our advantages on organosilicone productions:
1.Professional technical team, comprehensive technology of organic silicon monomers, ten years of experience in organic silicon technology development;
2.Rich resources of organic silicon monomers, more than1500 kinds of monomers can be developed and 500-600 have been developed.
3.Catch advance technology and information of organic silicon, follow cutting-edge of technology development, realize the development direction at any time.
4.Flexible collaboration patterns that provide special R&D of technology and products according to customers’ demand, to cooperate with customers in product service of performance modified.
5.Excellent product quality and after-sales service.